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You are here: Home » Products » The finishing surface CuCr Copper-chromium-sputtering target Ion Beam Sputtering
The finishing surface CuCr Copper-chromium-sputtering target Ion Beam Sputtering
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Product: Views:31The finishing surface CuCr Copper-chromium-sputtering target Ion Beam Sputtering 
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Valid until: Long-term effective
Last updated: 2017-09-25 05:58
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CuCr target Copper-chromium target (MAT-CN) Physical properties Color silver Density -g/m³ Melting point - Technical indicators purity 99.99% Relative density >99.9% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material CuCr Brand MAT-CN Origin Nanchang Jiangxi China Specifications Size 1: diameter <360mm thickness> 1 mm (wafer / round table / rod) Size 2: length <300mm width <300mm thickness> 1mm (rectangular / sheet /splicing) Size 3: outer diameter <360mm inner diameter> 1mm length> 1 mm (pipe / ring / rotatable targets) Size 4:be customized according to user needs, sample processing, to map processing Minimum order quantity 1 piece,large concessions Supply capacity the same batch, the same material, continuous and reliable supply; 100 kg / month min Delivery time 3 weeks after payment,excluding special materials Production process vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining Applicable instruments various models magnetron sputtering equipment, etc. Product uses industrial-grade coating, experiments or research level CuCr target electronics, optoelectronics, military, decorative, functional film Advantages quality 1.reasonable price and good quality 2.high purity, less impurities 3.dense, rolling, oxidation, forming plasticizers 4.relatively high density, grain uniformity axis, consistency
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